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Understanding interfaces and surfaces at a fundamental level and using this understanding to advance the state-of-the-art in various technological applications defines the scope of the Journal of Vacuum Science and Technology A. Accordingly, JVST A is devoted to publishing reports of original research, letters and review articles on subjects including but not limited toApplied and fundamental surface scienceAtomic layer depositionElectronic and photonic materials and their processingMagnetic thin films and interfacesMaterials and thin films for energy conversion and storagePhotovoltaics including thin-film solar cells and organic and hybrid solar cells,Plasma science and technology including plasma-surface interactions, plasma diagnostics plasma deposition and etching and applications of plasmas to micro- and nanoelectronicsSurface EngineeringThin film deposition, etching, properties and characterizationTransmission electron microscopy including in situ methodsTribologyVacuum science and technologyJVST A is published six times annually (Jan/Feb, Mar/Apr, May/Jun, Jul/Aug, Sep/Oct, Nov/Dec) by the AVS through the American Institute of Physics (AIP).